Date Announced: 22 Aug 2006 Dalian Meiming Epitaxy Technology To Increase Wafer Output With Additional AIXTRON Multiwafer ReactorsAachen, Germany - AIXTRON AG is pleased to announce the receipt of a multiple purchase order from Dalian Meiming Epitaxy Technology Co., Ltd. in Dalian, P.R. China.These reactors will be used for high volume production of III-V based LED and laser diode optoelectronic epitaxial wafers. They will be installed in Dalian Meiming Epitaxy Technology's manufacturing facilities in P.R. China and California, USA. The order follows the purchase of two AIXTRON systems, a 24x2 inch wafer capacity AIX 2400G3 HT and a 24x2 inch wafer capacity AIX 2600G3 HT which will be installed shortly."We have great plans for the expansion of our optoelectronics manufacturing capacity to meet the present and future needs of our customer base," said Dalian Meiming Epitaxy Technology's President Xiao. "This comprehensive equipment purchase package will need the very best technical and service support. It is why we have selected AIXTRON as our supplier. We have been very impressed with the reliability of these reactors as well as their high throughput, excellent uniformity and low cost of ownership. The combination of performance and support is essential to the future of our company and our customers.”Dr. Bernd Schulte, Executive Vice President and COO of AIXTRON adds: "Taken together this is one of the biggest single orders we have so far received from a China-based customer. These MOCVD tools will meet all the requirements for Dalian Meiming Epitaxy Technology in growth capacity, flexibility and productivity. "It also demonstrates that AIXTRON is supplying to its customers an outstanding port-folio consisting of horizontal as well as vertical flow regime systems being delivered from one MOCVD equipment supplier. President Xiao and his team are taking advantage of this option establishing both approaches for epitaxial deposition at their facility.”
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